2014-Feng Pan Research Group

Publications

2022-10-31

2014

1. Z.Z. Wu, X.G. Han, J.X. Zheng, Y. Wei, R.M. Qiao, F. Shen, J.Q. Dai, L.B. Hu, K. Xu, Y. Lin, W.L. Yang, F. Pan*, "Depolarized and fully active cathode based on Li(Ni0.5Co0.2Mn0.3)O2 embedded in CNT network for advanced batteries", Nano Lett. 2014, 14, 4700-4706.
2. H. Fan, N. Zhao*, H. Wang, J. Xu*, F. Pan*, "3D conductive network-based free-standing PANI-RGO-MWNTs hybrid film for high-performance flexible supercapacitor", J. Mater. Chem. A. 2014, 2, 12340-12347.
3. B. Wang, J. Zhang, H.L. Tam, B. W, W.F. Zhang, M.S. Chan, F. Pan, G. Yu*, F.R. Zhu*, M.S. Wong*, "Impact of alkyl side chains on the photovoltaic and naphthodithiophene–benzothiadiazole", Polym. Chem. 2014, 5, 836.
4. F.S. Liu^, J.X. Zheng^, M.J. Huang, L.P. He, W.Q. Ao, F. Pan*, J.Q. Li*, "Enhanced thermoelectric performance for Cu2CdSnSe4 by Mn doping: experimental and first principles studies", Sci. Rep. 2014, 4, 5774.
5. H.S. Fan, H. Wang, N. Zhao, J. Xu, F. Pan*, "Nano-porous architecture of N-doped carbon nanorods grown on graphene to enable synergetic effects of supercapacitance", Sci. Rep. 2014, 4, 7426.
6. Z.Z. Wu, X.B. Tian*, Y.Q. Wei, C.Z. Gong, S.Q. Yang, F. Pan*, P.K. Chu, "Graded nanostructured interfacial layers fabricated by high power pulsed magnetron sputtering - plasma immersion ion implantation and deposition (HPPMS-PIII&D)", Surf. Coat. Tech. 2014, 46, 320-325.
7. Z.Z. Wu, X.B. Tian*, D.G. Ma, Y.Q. Wei, C.Z. Gong, F. Pan*, P.K. Chu, "High temperature oxidation of Cr-N coatings prepared by high powerpulsed magnetron sputtering - Plasma immersion ion implantation &deposition", Vacuum. 2014, 108, 66-70.
8. Z. Z. Wu*, X. B. Tian, F. Pan, J. Y. Fu, J. H. Zhu, "High power pulsed magnetron sputtering discharge behavior of various target materials", Acta metall. Sin. 2014, 50, 1279-1284.
9. Z. Z. Wu*, X. B. Tian*, C. W. Li, R.K.Y. Fu, F. Pan, J. H. Zhu, "Phasic discharge characteristics in high power pulsed magnetron sputtering", Acta Phys. Sin. 2014, 63, 175201.
10. Z. Z. Wu*, X. B. Tian, F. Pan, R.K.Y. Fu, J. H. Zhu, "Enhanced discharge of high power pulsed magnetron sputtering coupling with high voltage", Acta Phys. Sin. 2014, 63, 185207.